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Home > Anterior Cervical Plating Systems > CVD Ald Atomic Layer Deposition System for Powder Coating Plating
CVD Ald Atomic Layer Deposition System for Powder Coating Plating
CVD Ald Atomic Layer Deposition System for Powder Coating Plating
CVD Ald Atomic Layer Deposition System for Powder Coating Plating
CVD Ald Atomic Layer Deposition System for Powder Coating Plating
CVD Ald Atomic Layer Deposition System for Powder Coating Plating
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CVD Ald Atomic Layer Deposition System for Powder Coating Plating
CVD Ald Atomic Layer Deposition System for Powder Coating Plating
CVD Ald Atomic Layer Deposition System for Powder Coating Plating
CVD Ald Atomic Layer Deposition System for Powder Coating Plating
CVD Ald Atomic Layer Deposition System for Powder Coating Plating

CVD Ald Atomic Layer Deposition System for Powder Coating Plating

Customization: Available
After-sales Service: Onlin
Warranty: 1
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Product Description

Basic Information
Model NO. CY-ALD
Type Coating Production Line
Coating Vacuum Coating
Certification CE
Wafer Dimension 8 Inch and Below
Wafer Temperature Rt-400c, Precision ±0.1c
Background Vacuum <5*10-3torr
Product Overview
CVD ALD Atomic Layer Deposition System is a single-wafer deposition system specially designed for scientific research and small-scale experiments of industrialization. The system is widely used in the fields of micro-electronic, nano material, optical film, solar battery etc.
⚙️ Advanced software controlling system: many functions are integrated including technological formulation and parameter setting.
🛡️ Precision Control: Temperature controlling precision up to ±0.1ºC for both wafer and precursor lines.
🔬 High Compatibility: Suitable for Elementary substances, Nitrides, Oxides, and special nano-film structures.
ALD Film Materials & Applications

Commonly Deposited Materials:

Oxides: TiO2, HfO2, SiO2, ZnO, Al2O3 Nitrides: TiN, SiN, AlN, TaN, WN Metals: Co, Cu, Ta, Ti, W, Pt, Ru Others: GaAs, InP, SrTiO3

Primary Applications:

High-k gate oxides & Dielectrics
Pinhole-free passivation for OLEDs
MEMS & Nano-porous coatings
Solar battery & Optical thin-films
Technical Parameters
Feature Specifications
Wafer TemperatureRT-400ºC, Precision ±0.1ºC
Number of PrecursorThree lines (Optional more)
Source Bottle TempRT-200ºC, Precision ±0.1ºC
ALD ValveSwagelok ALD swift valve
Gas CarrierN2 or Ar
Growing ModeConsecutive or interval deposition
UniformityHeterogeneity < ±1%
Instrument Size600mm x 600mm x 1100mm
Detailed Photos
ALD System
ALD System Detail
ALD Equipment
ALD Unit
Control Panel
Internal Components
Production Facility
Technical Layout
Frequently Asked Questions
Are you a manufacturer?
Yes, we are professional laboratory instrument manufacturers with our own design team and factory, ensuring high quality and optimal pricing.
What is the after-sales service system?
The product warranty period is 12 months with lifetime maintenance provided. We respond to technical issues within 24 hours.
How long is the delivery time?
For stock items, it takes 5-10 days. For customized instruments, it usually takes 30-60 days depending on specific requirements.
Can you adapt the power supply for our country?
Yes, we can supply transformers and plugs according to your local power requirements and standards.
What are the available payment methods?
We accept T/T, L/C, D/P, and other standard payment methods; Trade Guarantee is also recommended.
How is the equipment packaged for shipping?
We use standard export fumigation wooden box packaging. Delivery can be arranged via express, air, or sea shipping.

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