Vacuum Plating Thin Film Magnetron Sputtering PVD Coating Systems

Three targets RF magnetron sputtering coater is a cost-effective magnetron sputtering coating equipment. It is standardized, modular and customizable. There are 1-inch or 2-inch magnetron targets for you to choose. Customers can choose the target according to the size of the substrate to be coated. The device is equipped with three 300W RF power supply. The RF power supply can be used for the preparation of non-metal. The three targets can meet the needs of multi-layer or multiple coatings. If customers have other coating needs, DC power supply and pulse power supply can be customized. Various types of power supply are available from 300W to 1000W in various specifications.

The coating machine is equipped with two-channel high-precision mass flowmeter. The gas path can be customized up to four-channel mass flowmeters to meet complex gas environment construction requirements. The instrument is equipped with advanced turbomolecular pump sets, the ultimate vacuum is up to 1.0E-5Pa. Molecular pump gas path is controlled by multiple solenoid valves, allowing users to open the chamber to take out the sample without shutting down the pump, greatly improving work efficiency. This product can be equipped with an integrated industrial computer to control the system.

This device can be used for preparing single-layer or multi-layer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, oxide films, hard films, PTFE films, and the like. It is an ideal equipment for preparing material films in a laboratory due to its small size and easy operation.